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Titanium Dioxide (TiO2) Sputtering TargetsTitanium oxide TiO2 sputtering targetis used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. Paints and Coatings: Titanium dioxide provides opacity and durability,...
Titanium oxide TiO2 sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. Paints and Coatings: Titanium dioxide provides opacity and durability, while helping to ensure the longevity of the paint and protection of the painted surface. Titanium dioxide is well-known for having a very high refractive index, and this has led to its common use in thin-film optics.TiO2 sputtering target is used for thin film deposition.
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Specifications | |||
Material Type | Titanium Dioxide | ||
Symbol | TiO2 | ||
Purity | 99.99% | ||
Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
Package Unit | 1pc | ||
Theoretical Density (g/cc) | 4.23 | ||
Melting Point (°C) | 1,830 | Sputter | RF, RF-R |
Type of Bond | Indium, Elastomer | Max Power Density (Watts/Square Inch) | 20* |
Comments | Suboxide, must be reoxidized to rutile. Ta reduces TiO2 to TiO and Ti. | Color/Appearance | White-Beige, Gray-Black |
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