Sputtering Targets

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Titanium Dioxide (TiO2) Sputtering Targets

Description:

Titanium Dioxide (TiO2) Sputtering TargetsTitanium oxide TiO2 sputtering targetis used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. Paints and Coatings: Titanium dioxide provides opacity and durability,...

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Titanium Dioxide (TiO2) Sputtering Targets

Titanium oxide TiO2 sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. Paints and Coatings: Titanium dioxide provides opacity and durability, while helping to ensure the longevity of the paint and protection of the painted surface. Titanium dioxide is well-known for having a very high refractive index, and this has led to its common use in thin-film optics.TiO2 sputtering target is used for thin film deposition.

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TiO2 sputtering target

Specifications
Material TypeTitanium Dioxide
SymbolTiO2
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)4.23
Melting Point (°C)1,830SputterRF, RF-R
Type of BondIndium, ElastomerMax Power Density
(Watts/Square Inch)
20*
CommentsSuboxide, must be reoxidized to rutile. Ta reduces TiO2 to TiO and Ti.Color/AppearanceWhite-Beige, Gray-Black


 


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