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Tantalum Nitride Sputtering Targets are used for tantalum nitride films increase the wear resistance and life of cutting tools.
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| Specifications | |||
| Material Type | Tantalum Nitride | ||
| Symbol | TaN | ||
| Purity | 99.9% | ||
| Size | 1.00" Dia. x 0.125" Thick ~8.00" Dia x 0.250" Thick / Custom | ||
| Package Unit | 1pc | ||
| Theoretical Density (g/cc) | 14.6 | ||
| Melting Point (°C) | 3360°C | Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer | Max Power Density (Watts/Square Inch) | 20* |
