Sputtering Targets

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Fluorine Doped Tin Oxide (FTO) Sputtering Target

Description:

FTO Sputtering Targetsare used for transparent conductive films in electro-optical displays of the liquid crystal, electro-luminescent and g~s discharge types.For questions about target material or anything we can hlep, please clickhere.SpecificationsMaterial TypeFluorine Doped Tin Oxide...

Detail

FTO Sputtering Targets are used for transparent conductive films in electro-optical displays of the liquid crystal, electro-luminescent and g~s discharge types.

For questions about target material or anything we can hlep, please click here.



FTO sputtering target

Specifications
Material TypeFluorine Doped Tin Oxide
SymbolFTO
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Theoretical Density (g/cc)6.95
Melting Point (°C)1127 °CSputterRF, RF-R, DC


 


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