Sputtering Targets

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Aluminum Copper (A/Cu) Alloy Sputtering Target

Description:

High Purity Aluminum-copper alloy targets are widely used in semiconductor and other fields....

Detail

Aluminum Copper Sputtering Targets


Aluminum-copper alloy is very hard, melting point is 640 ° C, the composition of copper is generally 1% ~ 3% . The main properties of Al-Cu are high mechanical properties at room temperature and high temperature, simple casting process, good cutting performance and excellent heat resistance. Al-Cu alloy has good mechanical properties, high strength and easy processing, and low density, it can be used as light structure material. High Purity Aluminum-copper alloy targets are widely used in semiconductor and other fields.


Specifications
Material TypeAluminum Copper
SymbolAl/Cu
Purity99.99%
Size1.00" Dia. x 0.125" Thick ~8.00" Dia x  0.250" Thick / Custom
Package Unit1pc
Element RatioCustomized


 


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